Difference between revisions of "Kikuchi patterns"

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Sharp intersecting lines are sometimes observed in [[scattering]] data for single-crystal materials (e.g. if one's sample is supported on a [[Material:Silicon|silicon]] substrate). In electron microscopy, these are called '''Kikuchi patterns''', while in x-ray scattering there may be called '''Kossel lines'''.
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Sharp intersecting lines are sometimes observed in [[scattering]] data for single-crystal materials (e.g. if one's sample is supported on a [[Material:Silicon|silicon]] substrate). In electron microscopy, multiple-scattering events create these '''Kikuchi patterns''', while in x-ray scattering they may be called '''Kossel lines'''.
 
 
These arise from the intersection of the detector plane ([[Ewald sphere]]) with the [[reciprocal-space]] scattering.
 
  
  

Revision as of 17:14, 13 October 2015

Sharp intersecting lines are sometimes observed in scattering data for single-crystal materials (e.g. if one's sample is supported on a silicon substrate). In electron microscopy, multiple-scattering events create these Kikuchi patterns, while in x-ray scattering they may be called Kossel lines.


See Also