Material:Silicon dioxide

Silicon dioxide (SiO₂), also known as silica, spontaneously forms on the surface of a silicon wafer exposed to air. This 'native oxide' must be included in calculations of (for example) the x-ray reflectivity curve for a Si surface. In terms of x-ray properties, SiO₂ can be used to approximate a variety of related materials (fused quartz, glass, etc.).

Properties

• Density: 2.648 g/cm³
• Neutron SLD: 4.183×10⁻⁶ Å⁻²

Material	density (g/cm3)	X-ray energy (keV)	X-ray wavelength (Å)	critical angle (°)	qc (Å−1)	SLD (10−6Å−2)
SiO2	2.648	2.0	6.20	0.927	0.0328	21.42
		4.0	3.10	0.480	0.0340	22.96
		8.0	1.55	0.239	0.0338	22.71
		12.0	1.03	0.159	0.0337	22.58
		13.5	0.92	0.141	0.0337	22.56
		16.0	0.77	0.119	0.0337	22.53
		24.0	0.52	0.079	0.0336	22.48

See Also

• Wikipedia: Silicon dioxide