Difference between revisions of "Multiple scattering"
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| + | ==Kikuchi patterns== | ||
| + | Sharp intersecting lines are sometimes observed in [[diffraction]] data for single-crystal or poly-crystalline materials, depending on the experimental geometry. In electron microscopy, multiple-scattering events create these '''Kikuchi patterns''', while in x-ray scattering they may be called '''Kossel lines'''. These lines arise due to multiple-scattering effect, e.g. when the x-ray source has high divergence. | ||
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| + | Using a high-flux [[x-ray]] source ([[synchrotron]]), one can observe a related effect purely from the [[diffuse scattering]] undergoing multiple scattering. 'Multiple diffuse scattering' (DMS) can thus give rise to weak lines in a [[scattering]] image for crystalline materials (e.g. if one's sample is supported on a [[Material:Silicon|silicon]] substrate). | ||
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| + | ==See Also== | ||
| + | * W. G. Morris [http://scitation.aip.org/content/aip/journal/jap/39/3/10.1063/1.1656436 Crystal orientation and lattice parameters from Kossel lines] ''J. Appl. Phys.'' '''1968''', 39, 1813–1823. [http://dx.doi.org/10.1063/1.1656436 doi: 10.1063/1.1656436] | ||
| + | * G. Nolze, C. Grosse and A. Winkelmann [http://scripts.iucr.org/cgi-bin/paper?vh5033 Kikuchi pattern analysis of noncentrosymmetric crystals] ''J. Appl. Cryst.'' '''2015''', 48. [http://dx.doi.org/10.1107/S1600576715014016 doi: 10.1107/S1600576715014016] | ||
| + | * A.G.A. Nisbet, G. Beutier, F. Fabrizi, B. Mosera and S. P. Collins [http://journals.iucr.org/a/issues/2015/01/00/td5022/index.html Diffuse multiple scattering] ''Acta Cryst. A'' '''2015''', 20-25. [http://dx.doi.org/10.1107/S2053273314026515 doi: 10.1107/S2053273314026515] | ||
Revision as of 10:56, 3 June 2019
TBD
Kikuchi patterns
Sharp intersecting lines are sometimes observed in diffraction data for single-crystal or poly-crystalline materials, depending on the experimental geometry. In electron microscopy, multiple-scattering events create these Kikuchi patterns, while in x-ray scattering they may be called Kossel lines. These lines arise due to multiple-scattering effect, e.g. when the x-ray source has high divergence.
Using a high-flux x-ray source (synchrotron), one can observe a related effect purely from the diffuse scattering undergoing multiple scattering. 'Multiple diffuse scattering' (DMS) can thus give rise to weak lines in a scattering image for crystalline materials (e.g. if one's sample is supported on a silicon substrate).
See Also
- W. G. Morris Crystal orientation and lattice parameters from Kossel lines J. Appl. Phys. 1968, 39, 1813–1823. doi: 10.1063/1.1656436
- G. Nolze, C. Grosse and A. Winkelmann Kikuchi pattern analysis of noncentrosymmetric crystals J. Appl. Cryst. 2015, 48. doi: 10.1107/S1600576715014016
- A.G.A. Nisbet, G. Beutier, F. Fabrizi, B. Mosera and S. P. Collins Diffuse multiple scattering Acta Cryst. A 2015, 20-25. doi: 10.1107/S2053273314026515
