Difference between revisions of "Material:Silicon dioxide"
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| + | '''Silicon dioxide''' (SiO<sub>2</sub>), also known as silica, spontaneously forms on the surface of a [[Material:Silicon|silicon]] wafer exposed to air. This 'native oxide' must be included in calculations of (for example) the x-ray [[reflectivity]] curve for a Si surface. In terms of x-ray properties, SiO<sub>2</sub> can be used to approximate a variety of related materials (fused quartz, glass, etc.). | ||
| + | |||
| + | ==Properties== | ||
| + | * Density: 2.648 g/cm<sup>3</sup> | ||
| + | * Neutron SLD: 4.183×10<sup>−6</sup> Å<sup>−2</sup> | ||
{| class="wikitable" | {| class="wikitable" | ||
Revision as of 17:21, 4 June 2014
Silicon dioxide (SiO2), also known as silica, spontaneously forms on the surface of a silicon wafer exposed to air. This 'native oxide' must be included in calculations of (for example) the x-ray reflectivity curve for a Si surface. In terms of x-ray properties, SiO2 can be used to approximate a variety of related materials (fused quartz, glass, etc.).
Properties
- Density: 2.648 g/cm3
- Neutron SLD: 4.183×10−6 Å−2
| Material | density (g/cm3) | X-ray energy (keV) | X-ray wavelength (Å) | critical angle (°) | qc (Å−1) | SLD (10−6Å−2) |
|---|---|---|---|---|---|---|
| SiO2 | 2.648 | 2.0 | 6.20 | 0.927 | 0.0328 | 21.42 |
| 4.0 | 3.10 | 0.480 | 0.0340 | 22.96 | ||
| 8.0 | 1.55 | 0.239 | 0.0338 | 22.71 | ||
| 12.0 | 1.03 | 0.159 | 0.0337 | 22.58 | ||
| 16.0 | 0.77 | 0.119 | 0.0337 | 22.53 | ||
| 24.0 | 0.52 | 0.079 | 0.0336 | 22.48 |
