Difference between revisions of "CD-SAXS"
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'''Critical-Dimension Small-Angle X-ray Scattering''' ('''CD-SAXS''') is an [[x-ray]] [[scattering]] technique that can be used to reconstruct the in-plane and out-of-plane structure of nanostructured thin-films. The technique consists of collecting a series of transmission [[SAXS]] images, at a variety of [[sample orientation|sample rotation angles]]. These <math>\scriptstyle (q_x, q_y)</math> images can be combined to reconstruct the 3D [[reciprocal-space]], in particular probing the <math>\scriptstyle (q_y, q_z)</math> slice that contains both in-plane and out-of-plane (film normal direction) information. | '''Critical-Dimension Small-Angle X-ray Scattering''' ('''CD-SAXS''') is an [[x-ray]] [[scattering]] technique that can be used to reconstruct the in-plane and out-of-plane structure of nanostructured thin-films. The technique consists of collecting a series of transmission [[SAXS]] images, at a variety of [[sample orientation|sample rotation angles]]. These <math>\scriptstyle (q_x, q_y)</math> images can be combined to reconstruct the 3D [[reciprocal-space]], in particular probing the <math>\scriptstyle (q_y, q_z)</math> slice that contains both in-plane and out-of-plane (film normal direction) information. | ||
| − | The technique derives its name from CD-SEM, a [[realspace]] microscopy used measure the 'critical dimensions' of a structure. CD-SAXS can also be called '''rotational-SAXS''' ('''RSAXS'''); indeed the neutron variant is typically called [[RSANS]]. It is closely related to a variety of other scattering/diffraction techniques that involve rotating the sample in order to reconstruct reciprocal-space (c.f. [[pole figure]]s). | + | The technique derives its name from CD-SEM, a [[realspace]] microscopy used measure the 'critical dimensions' of a structure. CD-SAXS can also be called '''rotational-SAXS''' ('''RSAXS'''); indeed the neutron variant is typically called [[RSANS]]. It is closely related to a variety of other scattering/diffraction techniques that involve rotating the sample in order to [[reciprocal-space mapping|reconstruct reciprocal-space]] (c.f. [[pole figure]]s). |
CD-SEM is frequently used in the lithography and nanofabrication industry as a metrology for the quality of fabrication process. Similarly, CD-SAXS is ideally suited to quantifying the average structure of well-defined entities such as lithographic line-gratings. Indeed, CD-SAXS can reliably probe a grating's repeat period, height, and sidewall angle (or, more generally, the grating's cross-sectional profile). In principle, this technique can quantify aspects of defects and disorder (e.g. line-edge roughness, LER). | CD-SEM is frequently used in the lithography and nanofabrication industry as a metrology for the quality of fabrication process. Similarly, CD-SAXS is ideally suited to quantifying the average structure of well-defined entities such as lithographic line-gratings. Indeed, CD-SAXS can reliably probe a grating's repeat period, height, and sidewall angle (or, more generally, the grating's cross-sectional profile). In principle, this technique can quantify aspects of defects and disorder (e.g. line-edge roughness, LER). | ||
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===Lithographic structures=== | ===Lithographic structures=== | ||
* Chengqing Wang ; Ronald L. Jones ; Eric K. Lin ; Wen-li Wu ; John S. Villarrubia ; Kwang-Woo Choi ; James S. Clarke ; Bryan J. Rice ; Michael J. Leeson ; Jeanette Roberts ; Robert Bristol ; Benjamin Bunday [http://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1300174 Line edge roughness characterization of sub-50nm structures using CD-SAXS: round-robin benchmark results] ''Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI'' '''2007''', 651810 [http://dx.doi.org/10.1117/12.725380 doi: 10.1117/12.725380] | * Chengqing Wang ; Ronald L. Jones ; Eric K. Lin ; Wen-li Wu ; John S. Villarrubia ; Kwang-Woo Choi ; James S. Clarke ; Bryan J. Rice ; Michael J. Leeson ; Jeanette Roberts ; Robert Bristol ; Benjamin Bunday [http://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1300174 Line edge roughness characterization of sub-50nm structures using CD-SAXS: round-robin benchmark results] ''Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI'' '''2007''', 651810 [http://dx.doi.org/10.1117/12.725380 doi: 10.1117/12.725380] | ||
| + | * Chengqing Wang; Kwang-Woo Choi; Wei-En Fu; Derek L. Ho; Ronald L. Jones; Christopher Soles; Eric K. Lin; Wen-Li Wu; James S. Clarke; Benjamin Bunday [http://spie.org/Publications/Proceedings/Paper/10.1117/12.773774 CD-SAXS measurements using laboratory-based and synchrotron-based instruments] ''Proc. SPIE 6922, Metrology, Inspection, and Process Control for Microlithography XXII'' '''2008''', 69222E [http://dx.doi.org/10.1117/12.773774 doi: 10.1117/12.773774] | ||
* Chengqing Wang ; Kwang-Woo Choi ; Yi-Ching Chen ; Jimmy Price ; Derek L. Ho ; Ronald L. Jones ; Christopher Soles ; Erik K. Lin ; Wen-Li Wu ; Benjamin D. Bunday [http://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1336402 Nonplanar high-k dielectric thickness measurements using CD-SAXS] ''Proc. SPIE 7272, Metrology, Inspection, and Process Control for Microlithography XXIII'' '''2009''', 72722M [http://dx.doi.org/10.1117/12.813757 10.1117/12.813757] | * Chengqing Wang ; Kwang-Woo Choi ; Yi-Ching Chen ; Jimmy Price ; Derek L. Ho ; Ronald L. Jones ; Christopher Soles ; Erik K. Lin ; Wen-Li Wu ; Benjamin D. Bunday [http://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1336402 Nonplanar high-k dielectric thickness measurements using CD-SAXS] ''Proc. SPIE 7272, Metrology, Inspection, and Process Control for Microlithography XXIII'' '''2009''', 72722M [http://dx.doi.org/10.1117/12.813757 10.1117/12.813757] | ||
* Charles M. Settens; Aaron Cordes; Benjamin D. Bunday; Abner F. Bello; Vimal K. Kamineni; Abhijeet Paul; Jody Fronheiser; Richard J. Matyi [http://spie.org/Publications/Journal/10.1117/1.JMM.13.4.041408 Assessment of critical dimension small-angle x-ray scattering measurement approaches for FinFET fabrication process monitoring] ''Journal of Micro/Nanolithography, MEMS, and MOEMS'' '''2014''', 13 (4), 041408 [http://dx.doi.org/10.1117/1.JMM.13.4.041408 doi: 10.1117/1.JMM.13.4.041408] | * Charles M. Settens; Aaron Cordes; Benjamin D. Bunday; Abner F. Bello; Vimal K. Kamineni; Abhijeet Paul; Jody Fronheiser; Richard J. Matyi [http://spie.org/Publications/Journal/10.1117/1.JMM.13.4.041408 Assessment of critical dimension small-angle x-ray scattering measurement approaches for FinFET fabrication process monitoring] ''Journal of Micro/Nanolithography, MEMS, and MOEMS'' '''2014''', 13 (4), 041408 [http://dx.doi.org/10.1117/1.JMM.13.4.041408 doi: 10.1117/1.JMM.13.4.041408] | ||
| + | * D. F. Sunday, S. List, J. S. Chawla and R. J. Kline [http://scripts.iucr.org/cgi-bin/paper?vg5024 Determining the shape and periodicity of nanostructures using small-angle X-ray scattering] ''J. Appl. Cryst.'' '''2015''', 48. [http://dx.doi.org/10.1107/S1600576715013369 doi: 10.1107/S1600576715013369] | ||
===Nanoimprinted polymer=== | ===Nanoimprinted polymer=== | ||
| Line 24: | Line 26: | ||
* Ronald L. Jones, Tengjiao Hu, Christopher L. Soles, Eric K. Lin, Ronald M. Reano, Stella W. Pang, and Diego M. Casa [http://pubs.acs.org/doi/abs/10.1021/nl061086i Real-Time Shape Evolution of Nanoimprinted Polymer Structures during Thermal Annealing] ''Nano Letters'' ''2006''', 6 (8), 1723-1728 [http://dx.doi.org/10.1021/nl061086i doi: 10.1021/nl061086i] | * Ronald L. Jones, Tengjiao Hu, Christopher L. Soles, Eric K. Lin, Ronald M. Reano, Stella W. Pang, and Diego M. Casa [http://pubs.acs.org/doi/abs/10.1021/nl061086i Real-Time Shape Evolution of Nanoimprinted Polymer Structures during Thermal Annealing] ''Nano Letters'' ''2006''', 6 (8), 1723-1728 [http://dx.doi.org/10.1021/nl061086i doi: 10.1021/nl061086i] | ||
| − | ===Block-copolymer=== | + | ===[[Block-copolymer]]=== |
* Daniel F. Sunday ; Matthew R. Hammond ; Chengqing Wang ; Wen-li Wu ; R. Joseph Kline ; Gila E. Stein [http://nanolithography.spiedigitallibrary.org/article.aspx?articleid=1727051 Three-dimensional x-ray metrology for block copolymer lithography line-space patterns] ''Journal of Micro/Nanolithography, MEMS, and MOEMS'' '''2013''', 12 (3), 031103 [http://dx.doi.org/10.1117/1.JMM.12.3.031103 doi: 10.1117/1.JMM.12.3.031103] | * Daniel F. Sunday ; Matthew R. Hammond ; Chengqing Wang ; Wen-li Wu ; R. Joseph Kline ; Gila E. Stein [http://nanolithography.spiedigitallibrary.org/article.aspx?articleid=1727051 Three-dimensional x-ray metrology for block copolymer lithography line-space patterns] ''Journal of Micro/Nanolithography, MEMS, and MOEMS'' '''2013''', 12 (3), 031103 [http://dx.doi.org/10.1117/1.JMM.12.3.031103 doi: 10.1117/1.JMM.12.3.031103] | ||
* Daniel F. Sunday, Matthew R. Hammond, Chengqing Wang, Wen-li Wu, Dean M. Delongchamp, Melia Tjio, Joy Y. Cheng, Jed W. Pitera, and R. Joseph Kline [http://pubs.acs.org/doi/abs/10.1021/nn5029289 Determination of the Internal Morphology of Nanostructures Patterned by Directed Self Assembly] ''ACS Nano'' '''2014''', 8 (8), 8426-8437 [http://dx.doi.org/10.1021/nn5029289 doi: 10.1021/nn5029289] | * Daniel F. Sunday, Matthew R. Hammond, Chengqing Wang, Wen-li Wu, Dean M. Delongchamp, Melia Tjio, Joy Y. Cheng, Jed W. Pitera, and R. Joseph Kline [http://pubs.acs.org/doi/abs/10.1021/nn5029289 Determination of the Internal Morphology of Nanostructures Patterned by Directed Self Assembly] ''ACS Nano'' '''2014''', 8 (8), 8426-8437 [http://dx.doi.org/10.1021/nn5029289 doi: 10.1021/nn5029289] | ||
| + | * Khaira, G., Doxastakis, M., Bowen, A., Ren, J., Suh, H.S., Segal-Peretz, T., Chen, X., Zhou, C., Hannon, A.F., Ferrier, N.J., Vishwanath, V., Sunday, D.F., Gronheid, R., Kline, R.J., de Pablo, J.J., Nealey, P.F., [http://pubs.acs.org/doi/full/10.1021/acs.macromol.7b00691 Derivation of Multiple Covarying Material and Process Parameters Using Physics-Based Modeling of X-ray Data] ''Macromolecules'' '''2017''', 50, 7783–7793. [http://dx.doi.org/10.1021/acs.macromol.7b00691 doi:10.1021/acs.macromol.7b00691] | ||
| + | |||
| + | ===Reviews=== | ||
| + | * Wen-li Wu et al. [https://www.spiedigitallibrary.org/journals/journal-of-micro-nanopatterning-materials-and-metrology/volume-22/issue-3/031206/Review-of-the-key-milestones-in-the-development-of-critical/10.1117/1.JMM.22.3.031206.full#_=_ Review of the key milestones in the development of critical dimension small angle x-ray scattering at National Institute of Standards and Technology] ''SPIE Journal of Micro/Nanopatterning, Materials, and Metrology'' '''2023''', Vol. 22, Issue 3, 031206 [https://doi.org/10.1117/1.JMM.22.3.031206 doi: 10.1117/1.JMM.22.3.031206] | ||
==See Also== | ==See Also== | ||
| + | * [[RSANS]] | ||
* [[GISAXS]] can directly measure the <math>\scriptstyle (q_y, q_z)</math> plane in a single image, but introduces a [[refraction distortion]] and [[beam projection]]. | * [[GISAXS]] can directly measure the <math>\scriptstyle (q_y, q_z)</math> plane in a single image, but introduces a [[refraction distortion]] and [[beam projection]]. | ||
| − | * [[GTSAXS]] can measure the <math>\scriptstyle (q_y, q_z)</math> plane in a single image without distortion, but imposes | + | * [[GTSAXS]] can measure the <math>\scriptstyle (q_y, q_z)</math> plane in a single image without distortion, but imposes constraints on sample geometry. |
| + | * [http://www.nist.gov/mml/msed/functional_polymer/dimensional-metrology.cfm NIST Dimensional Metrology for Nanoscale Patterns] | ||
| + | * [https://go.usa.gov/xPz5q NIST tutorial video] | ||
Latest revision as of 09:21, 17 September 2024
Critical-Dimension Small-Angle X-ray Scattering (CD-SAXS) is an x-ray scattering technique that can be used to reconstruct the in-plane and out-of-plane structure of nanostructured thin-films. The technique consists of collecting a series of transmission SAXS images, at a variety of sample rotation angles. These images can be combined to reconstruct the 3D reciprocal-space, in particular probing the slice that contains both in-plane and out-of-plane (film normal direction) information.
The technique derives its name from CD-SEM, a realspace microscopy used measure the 'critical dimensions' of a structure. CD-SAXS can also be called rotational-SAXS (RSAXS); indeed the neutron variant is typically called RSANS. It is closely related to a variety of other scattering/diffraction techniques that involve rotating the sample in order to reconstruct reciprocal-space (c.f. pole figures).
CD-SEM is frequently used in the lithography and nanofabrication industry as a metrology for the quality of fabrication process. Similarly, CD-SAXS is ideally suited to quantifying the average structure of well-defined entities such as lithographic line-gratings. Indeed, CD-SAXS can reliably probe a grating's repeat period, height, and sidewall angle (or, more generally, the grating's cross-sectional profile). In principle, this technique can quantify aspects of defects and disorder (e.g. line-edge roughness, LER).
Contents
References
Gratings
- Wen-li Wu, Eric K. Lin, Qinghuang Lin and Marie Angelopolous Small angle neutron scattering measurements of nanoscale lithographic features Journal of Applied Physics 2000, 88, 7298 doi: 10.1063/1.1324688
- Ronald L. Jones, Tengjiao Hu, Eric K. Lin, Wen-Li Wu, Rainer Kolb, Diego M. Casa, Patrick J. Bolton and George G. Barclay Small angle x-ray scattering for sub-100 nm pattern characterization Applied Physics Letters 2003, 83, 4059 doi: 10.1063/1.1622793
- Ronald L. Jones ; Tengjiao Hu ; Christopher L. Soles ; Eric K. Lin ; Wen-li Wu ; Diego M. Casa ; Arpan Mahorowala Preliminary evaluation of line-edge roughness metrology based on CD-SAXS Proc. SPIE 5375, Metrology, Inspection, and Process Control for Microlithography XVIII 2004, 191 doi: 10.1117/12.535693
- Tengjiao Hu, Ronald L. Jones, Wen-li Wu, Eric K. Lin, Qinghuang Lin, Denis Keane, Steve Weigand and John Quintana Small angle x-ray scattering metrology for sidewall angle and cross section of nanometer scale line gratings Journal of Applied Physics 2004, 96, 1983 doi: 10.1063/1.1773376
- Chengqing Wang, Ronald L. Jones, Eric K. Lin, Wen-Li Wu, Bryan J. Rice, Kwang-Woo Choi, George Thompson, Steven J. Weigand and Denis T. Keane Characterization of correlated line edge roughness of nanoscale line gratings using small angle x-ray scattering Journal of Applied Physics 2007, 102, 024901 doi: 10.1063/1.2753588
- Chengqing Wang, Ronald L. Jones, Eric K. Lin, Wen-Li Wu, and Jim Leu Small angle x-ray scattering measurements of lithographic patterns with sidewall roughness from vertical standing waves Applied Physics Letters 2007, 90, 193122 doi: 10.1063/1.2737399
Lithographic structures
- Chengqing Wang ; Ronald L. Jones ; Eric K. Lin ; Wen-li Wu ; John S. Villarrubia ; Kwang-Woo Choi ; James S. Clarke ; Bryan J. Rice ; Michael J. Leeson ; Jeanette Roberts ; Robert Bristol ; Benjamin Bunday Line edge roughness characterization of sub-50nm structures using CD-SAXS: round-robin benchmark results Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI 2007, 651810 doi: 10.1117/12.725380
- Chengqing Wang; Kwang-Woo Choi; Wei-En Fu; Derek L. Ho; Ronald L. Jones; Christopher Soles; Eric K. Lin; Wen-Li Wu; James S. Clarke; Benjamin Bunday CD-SAXS measurements using laboratory-based and synchrotron-based instruments Proc. SPIE 6922, Metrology, Inspection, and Process Control for Microlithography XXII 2008, 69222E doi: 10.1117/12.773774
- Chengqing Wang ; Kwang-Woo Choi ; Yi-Ching Chen ; Jimmy Price ; Derek L. Ho ; Ronald L. Jones ; Christopher Soles ; Erik K. Lin ; Wen-Li Wu ; Benjamin D. Bunday Nonplanar high-k dielectric thickness measurements using CD-SAXS Proc. SPIE 7272, Metrology, Inspection, and Process Control for Microlithography XXIII 2009, 72722M 10.1117/12.813757
- Charles M. Settens; Aaron Cordes; Benjamin D. Bunday; Abner F. Bello; Vimal K. Kamineni; Abhijeet Paul; Jody Fronheiser; Richard J. Matyi Assessment of critical dimension small-angle x-ray scattering measurement approaches for FinFET fabrication process monitoring Journal of Micro/Nanolithography, MEMS, and MOEMS 2014, 13 (4), 041408 doi: 10.1117/1.JMM.13.4.041408
- D. F. Sunday, S. List, J. S. Chawla and R. J. Kline Determining the shape and periodicity of nanostructures using small-angle X-ray scattering J. Appl. Cryst. 2015, 48. doi: 10.1107/S1600576715013369
Nanoimprinted polymer
- Ronald L. Jones ; Christopher L. Soles ; Eric K. Lin ; Walter Hu ; Ronald M. Reano ; Stella W. Pang ; Steven J. Weigand ; Denis T. Keane ; John P. Quintana Pattern fidelity in nanoimprinted films using critical dimension small angle x-ray scattering Journal of Micro/Nanolithography, MEMS, and MOEMS 2006, 5 (1), 013001 doi: :10.1117/1.2170550
- Ronald L. Jones, Tengjiao Hu, Christopher L. Soles, Eric K. Lin, Ronald M. Reano, Stella W. Pang, and Diego M. Casa Real-Time Shape Evolution of Nanoimprinted Polymer Structures during Thermal Annealing Nano Letters 2006', 6 (8), 1723-1728 doi: 10.1021/nl061086i
Block-copolymer
- Daniel F. Sunday ; Matthew R. Hammond ; Chengqing Wang ; Wen-li Wu ; R. Joseph Kline ; Gila E. Stein Three-dimensional x-ray metrology for block copolymer lithography line-space patterns Journal of Micro/Nanolithography, MEMS, and MOEMS 2013, 12 (3), 031103 doi: 10.1117/1.JMM.12.3.031103
- Daniel F. Sunday, Matthew R. Hammond, Chengqing Wang, Wen-li Wu, Dean M. Delongchamp, Melia Tjio, Joy Y. Cheng, Jed W. Pitera, and R. Joseph Kline Determination of the Internal Morphology of Nanostructures Patterned by Directed Self Assembly ACS Nano 2014, 8 (8), 8426-8437 doi: 10.1021/nn5029289
- Khaira, G., Doxastakis, M., Bowen, A., Ren, J., Suh, H.S., Segal-Peretz, T., Chen, X., Zhou, C., Hannon, A.F., Ferrier, N.J., Vishwanath, V., Sunday, D.F., Gronheid, R., Kline, R.J., de Pablo, J.J., Nealey, P.F., Derivation of Multiple Covarying Material and Process Parameters Using Physics-Based Modeling of X-ray Data Macromolecules 2017, 50, 7783–7793. doi:10.1021/acs.macromol.7b00691
Reviews
- Wen-li Wu et al. Review of the key milestones in the development of critical dimension small angle x-ray scattering at National Institute of Standards and Technology SPIE Journal of Micro/Nanopatterning, Materials, and Metrology 2023, Vol. 22, Issue 3, 031206 doi: 10.1117/1.JMM.22.3.031206
See Also
- RSANS
- GISAXS can directly measure the plane in a single image, but introduces a refraction distortion and beam projection.
- GTSAXS can measure the plane in a single image without distortion, but imposes constraints on sample geometry.
- NIST Dimensional Metrology for Nanoscale Patterns
- NIST tutorial video
