The Complex Materials Scattering (CMS) beamline at NSLS-II is a synchrotron instrument focused on x-ray scattering. It is located at 11-BM (bending magnet port) on the NSLS-II floor, and features a three-pole wiggler source. It can perform SAXS and WAXS experiments, focusing on ambitious synchrotron experiments, including in-situ or operando studies of materials during synthesis, processing, or operation; and autonomous experiments including high-throughput explorations and 'intelligent' machine-guided exploration of parameter spaces.
CMS can perform a variety of experiments:
- Can perform experiments from 10 keV to 17 keV.
- Energy resolution (double multilayers): 10−3
- 0.003 Å−1 to 4.2 Å−1 (209 nm to 0.15 nm)
Ultimate resolution (detector pixel limited) is 0.0002 Å−1.
|beam size||beam divergence||pixel size||pixel FW @ 5 m||pixel FW @ 5 m, 13.5 keV||resolution||resolution|
|(mm)||(mrad)||(mm)||(mrad)||(Å−1)||FWHM (Å−1)||σ (Å−1)|
At start of endstation (bim3 ionchamber):
- 1.6 ×1012 ph/s/0.1%bw (1.5 × 0.1 mrad; diagnostic mesh in-place; 13.5 keV, 250 mA ring current)
- 1.5 ×1111 ph/s/0.1%bw (0.1 × 0.1 mrad; 13.5 keV, 250 mA ring current)
Near sample position, full beam (no slits):
- 1.3 ×1012 ph/s (13.5 keV, 250 mA ring current)
For 13.5 keV, 250 mA ring current:
|S4 slits size (mm)||beam divergence (mrad)||beam size at sample position (μm)||beam flux at sample/detector (ph/s)||olog|
|1.000 H × 1.000 V||0.10 H × 0.10 V||2.1×1011||834_2|
|0.200 H × 0.200 V||0.10 H × 0.10 V||1.2×1011||834_2|
|0.100 H × 0.100 V||0.10 H × 0.10 V||3.4×1010||834_2|
|0.050 H × 0.050 V||0.10 H × 0.10 V||8.6×109||834_2|
|0.020 H × 0.020 V||0.10 H × 0.10 V||1.1×109||834_2|
|0.100 H × 0.020 V||0.10 H × 0.10 V||5.4×109||834_2|
|0.100 H × 0.010 V||0.10 H × 0.10 V||1.9×109||834_2|
For 13.5 keV, 375 mA ring current:
|S4 slits size (mm)||beam divergence (mrad)||beam size at sample position (μm)||beam flux at sample/detector (ph/s)||source|
|0.200 H × 0.050 V||0.10 H × 0.10 V||5×1010||Estimated|
For 13.5 keV, 250 mA ring current:
|S4 slits size (mm)||beam divergence (mrad)||beam V size at sample position (μm)||beam flux at sample/detector (ph/s)||olog|
|0.100 H × 0.010 V||0.10 H × 0.10 V||33||2×109||819_1|
|0.100 H × 0.010 V||0.10 H × 0.05 V||22||1×109||821_1|
- With divergence of 0.1 mrad H x 0.05 mrad V and S4 beam size of 0.1 mm H x 0.01 mm V, "knife-edge" smy scan implies beam FWHM of ~ 22 um V at sample and flux of 1e+9 cts/s as measured at Pilatus (with attenuation factor included).
With divergence of 0.1 mrad H x 0.1 mrad V and S4 beam size of 0.1 mm H x 0.01 mm V, "knife-edge" smy scan implies beam FWHM of ~ 33 um V at sample and flux of 2e+9 cts/s as measured at
- Typical 50-100 µm
- Beam can be shaped (using slits) to 10 µm.
CMS is a flexible SAXS/WAXS instrument. The instrument has two detectors (SAXS and WAXS) that can be repositioned as needed for experiments. The sample environment is flexible, with the ability to measure samples in vacuum or in air.
CMS can accommodate a wide range of sample holders and customized (in-situ or operando) sample environments.
- Beamline phone number: 631-344-1911
| Masa Fukuto (beamline lead)
| Ruipeng Li (beamline staff)
| Kevin Yager (partner user beamline staff)
| Esther Tsai (partner user beamline staff)
Publications using data collected at the beamline should include the following in the acknowledgements sections:
- This research used resources of the Center for Functional Nanomaterials and the National Synchrotron Light Source II, which are U.S. DOE Office of Science Facilities, at Brookhaven National Laboratory under Contract No. DE-SC0012704.
- The CMS beamline configuration is stored at: https://github.com/NSLS-II-CMS.
- See Software for a list of software useful in SAXS/WAXS experiments.