Difference between revisions of "CMS"

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[[Image:logo_CMS_20.png|thumb|200px|right]]
 
[[Image:logo_CMS_20.png|thumb|200px|right]]
  
−
The '''Complex Materials Scattering''' ('''CMS''') [[beamline]] at [[NSLS-II]] is a [[synchrotron]] [[bending magnet]] instrument focused on [[x-ray]] [[scattering]]. It is located at 11-BM on the NSLS-II floor. It can perform [[SAXS]] and [[WAXS]] experiments, focusing on high-throughput and 'intelligent' machine-guided exploration of parameter spaces.
+
The '''Complex Materials Scattering''' ('''CMS''') [[beamline]] at [[NSLS-II]] is a [[synchrotron]] instrument focused on [[x-ray]] [[scattering]]. It is located at 11-BM ([[bending magnet]] port) on the NSLS-II floor, and features a [[three-pole wiggler]] source. It can perform [[SAXS]] and [[WAXS]] experiments, focusing on ambitious synchrotron experiments, including [[in-situ]] or [[operando]] studies of materials during synthesis, processing, or operation; and autonomous experiments including high-throughput explorations and 'intelligent' machine-guided exploration of parameter spaces.
 +
 
 +
[[Image:CMS_beamline01.jpg|thumb|500px|center]]
  
 
==Capabilities==
 
==Capabilities==
−
CHX can perform a variety of experiments:
+
CMS can perform a variety of experiments:
 
* [[SAXS]]
 
* [[SAXS]]
 
* [[GISAXS]]
 
* [[GISAXS]]
Line 17: Line 19:
  
 
===q-range===
 
===q-range===
−
* 0.002 Å<sup>−1</sup> to 4.2 Å<sup>−1</sup>
+
* 0.003 Å<sup>−1</sup> to 4.2 Å<sup>−1</sup> (209 nm to 0.15 nm)
  
 
===Resolution===
 
===Resolution===
−
TBD
+
Ultimate resolution (detector pixel limited) is 0.0002 Å<sup>−1</sup>.
 +
 
 +
{| class="wikitable"
 +
|-
 +
! beam size
 +
! beam divergence
 +
! pixel size
 +
! pixel FW @ 5 m
 +
! pixel FW @ 5 m, 13.5 keV
 +
! resolution
 +
! resolution
 +
|-
 +
! (mm)
 +
! (mrad)
 +
! (mm)
 +
! (mrad)
 +
! (Å<sup>−1</sup>)
 +
! FWHM (Å<sup>−1</sup>)
 +
! σ (Å<sup>−1</sup>)
 +
|-
 +
|-
 +
|-
 +
| 0.200
 +
| 0.10
 +
| 0.172
 +
| 0.03
 +
| 0.00024
 +
| 0.0007
 +
| 0.00030
 +
|-
 +
| 0.100
 +
| 0.05
 +
| 0.172
 +
| 0.03
 +
| 0.00024
 +
| 0.0002
 +
| 0.00008
 +
|-
 +
|}
 +
 
 +
* C.f. [https://logbook.nsls2.bnl.gov/11-BM/#120_1 Olog: test of diffraction grating (80 nm pitch).]
  
 
===Flux===
 
===Flux===
−
Full beam (no slits), near sample position:
+
 
−
* 1.3 &times;10<sup>12</sup> ph/s/1%bw (13.5 keV, 250 mA ring current)
+
====Full Beam====
 +
At start of endstation (bim3 ionchamber):
 +
* 1.6 &times;10<sup>12</sup> ph/s/0.1%bw (1.5 &times; 0.1 mrad; diagnostic mesh in-place; 13.5 keV, 250 mA ring current)
 +
* 1.5 &times;11<sup>11</sup> ph/s/0.1%bw (0.1 &times; 0.1 mrad; 13.5 keV, 250 mA ring current)
 +
 
 +
Near sample position, full beam (no slits):
 +
* '''1.3 &times;10<sup>12</sup> ph/s''' (13.5 keV, 250 mA ring current)
 +
 
 +
====Normal Beam====
 +
For 13.5 keV, 250 mA ring current:
 +
{| class="wikitable"
 +
|-
 +
! S4 slits size (mm)
 +
! beam divergence (mrad)
 +
! beam size at sample position (μm)
 +
! beam flux at sample/detector (ph/s)
 +
! olog
 +
|-
 +
|-
 +
| 1.000 H &times; 1.000 V
 +
| 0.10 H &times; 0.10 V
 +
|
 +
| '''2.1&times;10<sup>11</sup>'''
 +
| [https://logbook.nsls2.bnl.gov/11-BM/index.html#834_2 834_2]
 +
|-
 +
| 0.200 H &times; 0.200 V
 +
| 0.10 H &times; 0.10 V
 +
|
 +
| '''1.2&times;10<sup>11</sup>'''
 +
| [https://logbook.nsls2.bnl.gov/11-BM/index.html#834_2 834_2]
 +
|-
 +
| 0.100 H &times; 0.100 V
 +
| 0.10 H &times; 0.10 V
 +
|
 +
| '''3.4&times;10<sup>10</sup>'''
 +
| [https://logbook.nsls2.bnl.gov/11-BM/index.html#834_2 834_2]
 +
|-
 +
| 0.050 H &times; 0.050 V
 +
| 0.10 H &times; 0.10 V
 +
|
 +
| '''8.6&times;10<sup>9</sup>'''
 +
| [https://logbook.nsls2.bnl.gov/11-BM/index.html#834_2 834_2]
 +
|-
 +
| 0.020 H &times; 0.020 V
 +
| 0.10 H &times; 0.10 V
 +
|
 +
| '''1.1&times;10<sup>9</sup>'''
 +
| [https://logbook.nsls2.bnl.gov/11-BM/index.html#834_2 834_2]
 +
|-
 +
| 0.100 H &times; 0.020 V
 +
| 0.10 H &times; 0.10 V
 +
|
 +
| '''5.4&times;10<sup>9</sup>'''
 +
| [https://logbook.nsls2.bnl.gov/11-BM/index.html#834_2 834_2]
 +
|-
 +
| 0.100 H &times; 0.010 V
 +
| 0.10 H &times; 0.10 V
 +
|
 +
| '''1.9&times;10<sup>9</sup>'''
 +
| [https://logbook.nsls2.bnl.gov/11-BM/index.html#834_2 834_2]
 +
|-
 +
|}
 +
 
 +
For 13.5 keV, 375 mA ring current:
 +
{| class="wikitable"
 +
|-
 +
! S4 slits size (mm)
 +
! beam divergence (mrad)
 +
! beam size at sample position (μm)
 +
! beam flux at sample/detector (ph/s)
 +
! source
 +
|-
 +
|-
 +
| 0.200 H &times; 0.050 V
 +
| 0.10 H &times; 0.10 V
 +
|
 +
| '''5&times;10<sup>10</sup>'''
 +
| Estimated
 +
|-
 +
|}
 +
 
 +
====Small Beam====
 +
 
 +
For 13.5 keV, 250 mA ring current:
 +
{| class="wikitable"
 +
|-
 +
! S4 slits size (mm)
 +
! beam divergence (mrad)
 +
! beam V size at sample position (μm)
 +
! beam flux at sample/detector (ph/s)
 +
! olog
 +
|-
 +
|-
 +
|-
 +
| 0.100 H &times; 0.010 V
 +
| 0.10 H &times; 0.10 V
 +
| 33
 +
| '''2&times;10<sup>9</sup>'''
 +
| [https://logbook.nsls2.bnl.gov/11-BM/#819_1 819_1]
 +
|-
 +
| 0.100 H &times; 0.010 V
 +
| 0.10 H &times; 0.05 V
 +
| 22
 +
| '''1&times;10<sup>9</sup>'''
 +
| [https://logbook.nsls2.bnl.gov/11-BM/#821_1 821_1]
 +
|-
 +
|}
 +
 
 +
* With divergence of 0.1 mrad H x 0.05 mrad V and S4 beam size of 0.1 mm H x 0.01 mm V, "knife-edge" smy scan implies beam FWHM of ~ 22 um V at sample and flux of 1e+9 cts/s as measured at Pilatus (with attenuation factor included).
 +
 
 +
With divergence of 0.1 mrad H x 0.1 mrad V and S4 beam size of 0.1 mm H x 0.01 mm V, "knife-edge" smy scan implies beam FWHM of ~ 33 um V at sample and flux of 2e+9 cts/s as measured at
  
 
===Beam Size===
 
===Beam Size===
 
* Typical 50-100 µm
 
* Typical 50-100 µm
−
* Focusing to 20 µm possible.
+
* Beam can be shaped (using slits) to 10 µm.
 +
 
 +
==Configuration==
 +
CMS is a flexible SAXS/WAXS instrument. The instrument has two detectors (SAXS and WAXS) that can be repositioned as needed for experiments. The sample environment is flexible, with the ability to measure samples in vacuum or in air.
 +
* [[CMS:Sample area]]
 +
CMS can accommodate a wide range of sample holders and customized ([[in-situ]] or operando) sample environments.
 +
* [[CMS:Sample environments]]
  
 
==Access==
 
==Access==
−
CMS is currently under construction. In the future, access will be possible through the [http://www0.bnl.gov/ps/PASS/ NSLS-II proposal system], and through the [[CFN]] [https://www.bnl.gov/cfn/user/ proposal system]. Interested users should contact beamline staff.
+
CMS is available for general user experiments. Proposals can be submitted through the [http://www0.bnl.gov/ps/PASS/ NSLS-II proposal system], and through the [[CFN]] [https://www.bnl.gov/cfn/user/ proposal system]. Interested users should contact beamline staff.
 +
 
 +
==Contact==
 +
* '''Beamline phone number''': 631-344-'''1911'''
 +
===Beamline Staff===
 +
 
 +
 
 +
{| class="wikitable"
 +
|-
 +
| '''[http://staff.ps.bnl.gov/staff.aspx?id=10076 Masa Fukuto]''' (beamline lead)
 +
* email: [mailto:fukuto@bnl.gov fukuto@bnl.gov]
 +
* office phone: 631-344-'''5256'''
 +
* office location: Bldg. 744 (green LOB of NSLS-II), room 4L108
 +
| [[Image:Masa_Fukuto01.jpeg|150px|link=http://staff.ps.bnl.gov/staff.aspx?id=10076]]
 +
|-
 +
| Ruipeng Li (beamline staff)
 +
* email: [mailto:rli@bnl.gov rli@bnl.gov]
 +
* office phone: 631-344-'''5994'''
 +
* office location: Bldg. 744 (green LOB of NSLS-II), room 4L140
 +
| [[Image:Ruipeng_Li01.jpg|150px|link=https://www.bnl.gov/]]
 +
|-
 +
| '''[https://www.bnl.gov/cfn/people/staff.php?q=150 Kevin Yager]''' (partner user beamline staff)
 +
* email: [mailto:kyager@bnl.gov kyager@bnl.gov]
 +
* office phone: 631-344-'''7608'''
 +
* office location: Bldg. 735 (CFN), room 2018 (2nd floor, east side)
 +
| [[Image:Kevin_Yager01.jpg|150px|link=https://www.bnl.gov/cfn/people/staff.php?q=150]]
 +
|-
 +
| '''[https://www.bnl.gov/cfn/people/staff.php?q=232 Esther Tsai ]''' (partner user beamline staff)
 +
* email: [mailto:etsai@bnl.gov etsai@bnl.gov]
 +
* office phone: 631-344-'''6149'''
 +
* office location: Bldg. 735 (CFN), 2029 (2nd floor, east side)
 +
| [[Image:Esther-Tsai-270px.jpg|150px|link=https://www.bnl.gov/cfn/people/staff.php?q=232]]
 +
|-
 +
|-
 +
|}
 +
 
 +
==Acknowledgements==
 +
Publications using data collected at the beamline should include the following in the acknowledgements sections:
 +
: This research used resources of the Center for Functional Nanomaterials and the National Synchrotron Light Source II, which are U.S. DOE Office of Science Facilities, at Brookhaven National Laboratory under Contract No. DE-SC0012704.
  
 
==Training==
 
==Training==
 
* [https://www.bnl.gov/ps/training/Beamline-BST-Forms/PS-BST-11-BM.pdf Beamline Specific Training Form]
 
* [https://www.bnl.gov/ps/training/Beamline-BST-Forms/PS-BST-11-BM.pdf Beamline Specific Training Form]
 +
 +
==Software==
 +
* The CMS beamline configuration is stored at: [https://github.com/NSLS-II-CMS https://github.com/NSLS-II-CMS].
 +
* See [[Software]] for a list of software useful in SAXS/WAXS experiments.
  
 
==See Also==
 
==See Also==
 
* [https://www.bnl.gov/ps/beamlines/beamline.php?b=CMS Official site]
 
* [https://www.bnl.gov/ps/beamlines/beamline.php?b=CMS Official site]

Latest revision as of 08:23, 12 December 2018

Logo CMS 20.png

The Complex Materials Scattering (CMS) beamline at NSLS-II is a synchrotron instrument focused on x-ray scattering. It is located at 11-BM (bending magnet port) on the NSLS-II floor, and features a three-pole wiggler source. It can perform SAXS and WAXS experiments, focusing on ambitious synchrotron experiments, including in-situ or operando studies of materials during synthesis, processing, or operation; and autonomous experiments including high-throughput explorations and 'intelligent' machine-guided exploration of parameter spaces.

CMS beamline01.jpg

Capabilities

CMS can perform a variety of experiments:

Performance

Energy

  • Can perform experiments from 10 keV to 17 keV.
  • Energy resolution (double multilayers): 10−3

q-range

  • 0.003 Å−1 to 4.2 Å−1 (209 nm to 0.15 nm)

Resolution

Ultimate resolution (detector pixel limited) is 0.0002 Å−1.

beam size beam divergence pixel size pixel FW @ 5 m pixel FW @ 5 m, 13.5 keV resolution resolution
(mm) (mrad) (mm) (mrad) (Å−1) FWHM (Å−1) σ (Å−1)
0.200 0.10 0.172 0.03 0.00024 0.0007 0.00030
0.100 0.05 0.172 0.03 0.00024 0.0002 0.00008

Flux

Full Beam

At start of endstation (bim3 ionchamber):

  • 1.6 ×1012 ph/s/0.1%bw (1.5 × 0.1 mrad; diagnostic mesh in-place; 13.5 keV, 250 mA ring current)
  • 1.5 ×1111 ph/s/0.1%bw (0.1 × 0.1 mrad; 13.5 keV, 250 mA ring current)

Near sample position, full beam (no slits):

  • 1.3 ×1012 ph/s (13.5 keV, 250 mA ring current)

Normal Beam

For 13.5 keV, 250 mA ring current:

S4 slits size (mm) beam divergence (mrad) beam size at sample position (μm) beam flux at sample/detector (ph/s) olog
1.000 H × 1.000 V 0.10 H × 0.10 V 2.1×1011 834_2
0.200 H × 0.200 V 0.10 H × 0.10 V 1.2×1011 834_2
0.100 H × 0.100 V 0.10 H × 0.10 V 3.4×1010 834_2
0.050 H × 0.050 V 0.10 H × 0.10 V 8.6×109 834_2
0.020 H × 0.020 V 0.10 H × 0.10 V 1.1×109 834_2
0.100 H × 0.020 V 0.10 H × 0.10 V 5.4×109 834_2
0.100 H × 0.010 V 0.10 H × 0.10 V 1.9×109 834_2

For 13.5 keV, 375 mA ring current:

S4 slits size (mm) beam divergence (mrad) beam size at sample position (μm) beam flux at sample/detector (ph/s) source
0.200 H × 0.050 V 0.10 H × 0.10 V 5×1010 Estimated

Small Beam

For 13.5 keV, 250 mA ring current:

S4 slits size (mm) beam divergence (mrad) beam V size at sample position (μm) beam flux at sample/detector (ph/s) olog
0.100 H × 0.010 V 0.10 H × 0.10 V 33 2×109 819_1
0.100 H × 0.010 V 0.10 H × 0.05 V 22 1×109 821_1
  • With divergence of 0.1 mrad H x 0.05 mrad V and S4 beam size of 0.1 mm H x 0.01 mm V, "knife-edge" smy scan implies beam FWHM of ~ 22 um V at sample and flux of 1e+9 cts/s as measured at Pilatus (with attenuation factor included).

With divergence of 0.1 mrad H x 0.1 mrad V and S4 beam size of 0.1 mm H x 0.01 mm V, "knife-edge" smy scan implies beam FWHM of ~ 33 um V at sample and flux of 2e+9 cts/s as measured at

Beam Size

  • Typical 50-100 µm
  • Beam can be shaped (using slits) to 10 µm.

Configuration

CMS is a flexible SAXS/WAXS instrument. The instrument has two detectors (SAXS and WAXS) that can be repositioned as needed for experiments. The sample environment is flexible, with the ability to measure samples in vacuum or in air.

CMS can accommodate a wide range of sample holders and customized (in-situ or operando) sample environments.

Access

CMS is available for general user experiments. Proposals can be submitted through the NSLS-II proposal system, and through the CFN proposal system. Interested users should contact beamline staff.

Contact

  • Beamline phone number: 631-344-1911

Beamline Staff

Masa Fukuto (beamline lead)
  • email: fukuto@bnl.gov
  • office phone: 631-344-5256
  • office location: Bldg. 744 (green LOB of NSLS-II), room 4L108
 Masa Fukuto01.jpeg
Ruipeng Li (beamline staff)
  • email: rli@bnl.gov
  • office phone: 631-344-5994
  • office location: Bldg. 744 (green LOB of NSLS-II), room 4L140
 Ruipeng Li01.jpg
Kevin Yager (partner user beamline staff)
  • email: kyager@bnl.gov
  • office phone: 631-344-7608
  • office location: Bldg. 735 (CFN), room 2018 (2nd floor, east side)
 Kevin Yager01.jpg
Esther Tsai (partner user beamline staff)
  • email: etsai@bnl.gov
  • office phone: 631-344-6149
  • office location: Bldg. 735 (CFN), 2029 (2nd floor, east side)
 Esther-Tsai-270px.jpg

Acknowledgements

Publications using data collected at the beamline should include the following in the acknowledgements sections:

This research used resources of the Center for Functional Nanomaterials and the National Synchrotron Light Source II, which are U.S. DOE Office of Science Facilities, at Brookhaven National Laboratory under Contract No. DE-SC0012704.

Training

Software

See Also

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